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PI Tackles High-Resolution Focusing Demands in Metrology and Microscopy

Objective focusing stages bring precision where tolerances leave no room for error

Quality Digest
Wed, 08/05/2026 - 12:02
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(Physik Instrumente: Shrewsbury, MA) -- Physik Instrumente (PI), a global leader in precision motion control, provides new options for objective focusing stage applications.

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High-speed and high-resolution focusing is critical in wafer inspecting, measuring optical components, or imaging biological samples. Modern microscopes and surface metrology systems routinely operate at magnifications where depth of focus shrinks to just a few micrometers or even less. Under these conditions, even minor variations in sample height, surface topography, thermal drift, or vibration can push the area of interest out of focus, degrading both image quality and measurement accuracy.

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