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A CMM with Nanometer Uncertainty for a Micro Price

TriNano offers quick and versatile measurements on small features requiring 3-D nanometer uncertainty

TriNano
Thu, 10/20/2011 - 16:49
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(TriNano: Eindhoven, the Netherlands) -- TriNano is a new nano/micro coordinate measuring machine (CMM) for measuring objects with submillimeter features in 3-D and with nanometer uncertainty. Current micro-CMMs comply with the Abbe principle in 2-D or even in 3-D, which is a preferred method to reach 3-D nanometer uncertainty. Most of these CMMs are the result of academic research, in which the challenge is to achieve the lowest uncertainty over a large measurement range. This resulted in technologically advanced, but expensive, systems.

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Within the precision manufacturing industry a large measurement range often is not the most important factor. Most objects, or their molds, have dimensions of a few centimeters (e.g., lenses, watch base plates, small gears) and fit in a matchbox. Now a cost-effective device is available to measure these items in true 3-D (including sidewalls, steep slopes, and undercuts) with nanometer uncertainty.

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