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Ben Rennison

Executive committee member

Ben Rennison has been actively involved in metrology for more than eight years focusing on reverse engineering practices using structured light scanning and photogrammetry. His past research as faculty at Clemson University included developing pathways for entry into the metrology field and measuring the associated learning outcomes in order to become a professional metrologist. Rennison’s research interests include SDK programming for worker assistance, self-built structured light scanning methods, and texture-mapped heritage documentation.

Thu, 11/17/2016 - 16:17
The Dangers of Polygonization
Thu, 11/17/2016 - 16:17
The advancement of dimensional scanning technology has allowed massive amount of point cloud data to be obtained quickly. This data is used for analysis and reverse-engineering functions. Generally, once this data is collected, it will be…
      

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