(Alluxa: Santa Rosa, CA) -- Alluxa, a global leader in high-performance optical coatings, filters, and thin-film deposition technologies, has achieved a breakthrough with its proprietary Sirrus Plasma physical vapor deposition (PVD) process, which enables fully dense dielectric optical coatings with very low stress on thin substrates.

The innovative ULTRA Series thin-film dichroic filters are enhanced to offer a lower-stress alternative with industry-leading flatness performance. The same Alluxa ULTRA Series steep edges, high transmission, and superior reflection is available with improved intrinsic stress, resulting in fewer design constraints and optimal instrument performance. The new low-stress Sirrus coating process enables ultraflat dichroics on substrates < 1.0 mm, ideal for an array of microscopy, medical, and space-based applications.

Peter Egerton, president of Alluxa says, “We’re excited to bring a new capability like this to our customers. High performance, steep edge dichroics on ultrathin substrates has been a frequent request over the years, and the engineering team has worked hard to conceptualize and innovate a solution.”

Click here for additional information on Alluxa’s ULTRA Series dichroic filters.

ULTRA low-stress process shows a minimal change in flatness between uncoated (left) and coated substrates (right). Image: Alluxa