{domain:"www.qualitydigest.com",server:"169.47.211.87"} Skip to main content

        
User account menu
Main navigation
  • Topics
    • Customer Care
    • Regulated Industries
    • Research & Tech
    • Quality Improvement Tools
    • People Management
    • Metrology
    • Manufacturing
    • Roadshow
    • QMS & Standards
    • Statistical Methods
    • Resource Management
  • Videos/Webinars
    • All videos
    • Product Demos
    • Webinars
  • Advertise
    • Advertise
    • Submit B2B Press Release
    • Write for us
  • Metrology Hub
  • Training
  • Subscribe
  • Log in
Mobile Menu
  • Home
  • Topics
    • Customer Care
    • Regulated Industries
    • Research & Tech
    • Quality Improvement Tools
    • People Management
    • Metrology
    • Manufacturing
    • Roadshow
    • QMS & Standards
    • Statistical Methods
    • Supply Chain
    • Resource Management
  • Login / Subscribe
  • More...
    • All Features
    • All News
    • All Videos
    • Training

Princeton Infrared Technologies Announces Phase II SBIR Award From the Office of the Secretary of Defense

Award is for development of high-resolution SWIR electro-optical seeker

Wed, 10/13/2021 - 12:00
  • Comment
  • RSS

Social Sharing block

  • Print
Body

(Princeton Infrared Technologies: Monmouth Junction, NJ) -- Princeton Infrared Technologies, Inc. (PIRT), specialists in indium gallium arsenide (InGaAs) imaging technology and affordable shortwave-infrared (SWIR) linescan cameras, visible-SWIR science cameras, and 1- and 2-D imaging arrays, announces a Phase II Small Business Innovation Research (SBIR) award from the Office of The Secretary of Defense to fund the development of a Megapixel high resolution seeker with extended wavelength detection capability covering the entire SWIR range.

ADVERTISEMENT

The camera will have a high pixel operability with a digital output at greater than industry standard frame rate at full resolution. The imager will be manufactured on InP substrates using the InGaAs/GaAsSb system allowing for low cost and the ability to utilize modern III-V semiconductor processing. Additionally, the imager will be manufactured and hybridized at wafer scale to minimize cost.

 …

Want to continue?
Log in or create a FREE account.
Enter your username or email address
Enter the password that accompanies your username.
By logging in you agree to receive communication from Quality Digest. Privacy Policy.
Create a FREE account
Forgot My Password
You Might Like...
Implementing Manufacturing Training Programs in 2026
Otis Expands Little Engineers STEM Program Globally
CAISI Issues Request for Information About Securing AI Agent Systems
Baldrige Foundation Announces 2026 Leadership Awards
Michigan Metrology Announces Surface Roughness, Texture, and Tribology Course

Add new comment

Image CAPTCHA
Enter the characters shown in the image.
Please login to comment.

© 2026 Quality Digest. Copyright on content held by Quality Digest or by individual authors. Contact Quality Digest for reprint information.
“Quality Digest" is a trademark owned by Quality Circle Institute Inc.

footer
  • Home
  • Print QD: 1995-2008
  • Print QD: 2008-2009
  • Videos
  • Privacy Policy
  • Write for us
footer second menu
  • Subscribe to Quality Digest
  • About Us