(imec: Leuven, Belgium) -- imec, a world-leading research and innovation hub in advanced semiconductor technologies, has announced the arrival of the ASML EXE:5200 High NA EUV lithography system, the most advanced lithography tool available today.

With this strategic milestone, imec reinforces its position as the industry’s launchpad into the angstrom era, giving its global partners’ ecosystem early access to the next generation of chip-scaling technologies. Integrated directly with a comprehensive suite of patterning and metrology tools and materials, the High NA EUV system empowers imec and its ecosystem partners to unlock the performance needed to pioneer sub-2 nm logic and high-density memory technologies that will fuel the rapid growth of advanced AI and high-performance computing.

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