(Nova: Rehovot, Israel) -- Nova announced that its ELIPSON materials metrology solution has been selected as the tool of record by a leading global foundry customer for advanced gate-all-around (GAA) manufacturing processes.

The company has received orders and delivered several ELIPSON tools to the customer for use in various high-volume production processes.

The selection marks a significant milestone for the ELIPSON platform, which is designed to deliver nondestructive, in-die material characterization for the most challenging nodes in semiconductor fabrication. In addition, the recent adoption of the Nova Metrion platform by another GAA customer further expands the presence of Nova’s materials metrology solutions in advanced logic nodes production.

Nova ELIPSON leverages state-of-the-art Raman spectroscopy technology to provide precise, repeatable measurements of material properties—key requirements for next-generation device architectures. By enabling rapid, noncontact material analysis at the nanoscale, ELIPSON supports manufacturers’ needs for both innovation and efficiency in a dynamic market landscape.

Gaby Waisman, Nova president and CEO, says, “The selection of ELIPSON by a leading global foundry for GAA manufacturing underscores our commitment to delivering differentiated solutions for the evolving needs of our customers. These latest developments indicate the significant value of our materials metrology portfolio to the industry’s need for critical process insight in advanced nodes production.”