(Onto Innovation: Wilmington, MA) -- Onto Innovation Inc. has introduced the Atlas G6 optical critical dimension (OCD) metrology system, designed to address the growing complexity of process control in advanced semiconductor nodes. As the industry transitions to second-generation gate-all-around (GAA) logic and future vertical gate DRAM architectures to support AI applications, manufacturers face increasingly tighter structural dimensions, with reductions of up to 30% per generation.

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