(Onto Innovation: Wilmington, MA) -- Onto Innovation Inc. has introduced the Atlas G6 optical critical dimension (OCD) metrology system, designed to address the growing complexity of process control in advanced semiconductor nodes. As the industry transitions to second-generation gate-all-around (GAA) logic and future vertical gate DRAM architectures to support AI applications, manufacturers face increasingly tighter structural dimensions, with reductions of up to 30% per generation.

These smaller geometries demand greater precision in controlling individual nanowire measurements in GAA and smaller DRAM cell block sizes for high bandwidth memory (HBM). The Atlas G6 system introduces advanced optical technologies that deliver measurement accuracy and the small spot size needed to support these evolving requirements, enabling robust process control for next-generation devices. The Atlas G6 system has already secured multiple production orders from leading logic and memory manufacturers.

The Atlas G6 system delivers enhanced signal-to-noise performance even with significantly smaller spot sizes, enabling new and critical metrology capabilities for GAA and HBM technologies. For GAA devices, precise control of each individual nanowire is critical to ensure the electrical performance required to meet higher transistor speeds and lower power consumption targets of next-generation devices. The Atlas G6 system addresses this challenge with enhanced real-time stabilization technologies that improve measurement precision and accuracy.

For HBM, smaller DRAM cell block sizes boost bandwidth efficiency, reduce power consumption, and improve latency. The Atlas G6 system’s smaller spot size allows for direct on-device measurements in DRAM cell blocks, enabling tighter process windows and ultimately helping to improve yield and long-term reliability. Also, the system introduces an additional data channel, which—when combined with Onto’s proprietary AI Diffract OCD analysis software and model-guided machine learning algorithms—strengthens recipe robustness and shortens time to solution.

“As the latest evolution of our industry-leading and award-winning Atlas family, the Atlas G6 system provides control of device features that were previously difficult to measure,” says Ido Dolev, executive vice president of product solutions for Onto Innovation. “Advancements in AI technologies depend on innovations in process control, and the Atlas G6 metrology system sets a new benchmark for optical metrology performance.”

Onto Innovation's Atlas G6 optical critical dimension (OCD) metrology system delivers enhanced signal sensitivity, smaller spot size, and advanced precision for process control in next generation gate-all-around (GAA) logic and high bandwidth memory (HBM) device production. Designed to meet the stringent requirements of AI-driven semiconductor architectures, the Atlas G6 system enables accurate nanowire and DRAM cell block measurements, helping to improve yield, reliability, and performance.